High-density plasma source
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Abstract
The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.
37 Citations
73 Claims
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1-46. -46. (canceled)
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47. A plasma source comprising:
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a) a cathode assembly comprising an inner cathode section and an outer cathode section;
b) a first anode that is positioned adjacent to the outer cathode section and forming a gap there between; and
c) a power supply that generates a first electric field across the gap between the first anode and the outer cathode section and that generates a second electric field between the inner cathode section and a second anode, the first electric field ionizing a volume of feed gas that is located in the gap, thereby generating an initial plasma, the second electric field super-ionizing the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma. - View Dependent Claims (48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58)
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59. A plasma source comprising:
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a) a cathode assembly comprising an inner cathode section;
b) an excited atom source that is positioned adjacent to the inner cathode section, the excited atom source generating an initial plasma comprising excited atoms from a volume of feed gas; and
c) a power supply that generates an electric field between the inner cathode section and an anode, the electric field super-ionizing the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma. - View Dependent Claims (60, 61, 62, 63, 64, 65, 66, 67)
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68. A method of generating a high-density plasma, the method comprising:
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a) generating a first electric field across a gap between a first anode and an outer cathode section, the first electric field ionizing a volume of feed gas that is located in the gap, thereby generating an initial plasma in the gap; and
b) generating a second electric field between a second anode and an inner cathode section, the second electric field super-ionizing the initial plasma, thereby generating a plasma comprising a higher density of ions than the initial plasma. - View Dependent Claims (69, 70, 71, 72, 73)
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Specification