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Thin film transistor array and method for fabricating the same

DC CAFC
  • US 6,211,534 B1
  • Filed: 05/12/1999
  • Issued: 04/03/2001
  • Est. Priority Date: 05/14/1998
  • Status: Expired due to Term
First Claim
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1. A thin film transistor array comprising:

  • a substrate;

    a plurality of pixel electrodes formed on said, substrate and disposed in a matrix having rows and columns;

    a plurality of thin film transistors (TFTs) for display which are formed on said substrate and each of which is connected to a corresponding one of said pixel electrodes;

    a plurality of gate wirings which are formed on said substrate, which are formed by a first conductor layer, each of which is disposed along every row of said pixel electrodes and each of which is used for supplying a gate signal to said TFTs in a corresponding row;

    a plurality of signal lines which are formed on said substrate, which are formed by a second conductor layer, each of which is disposed along every column of said pixel electrodes, and each of which is used for supplying a data signal to said TFTs in a corresponding column;

    a common conductor line on the gate wiring side formed on said substrate and extending in a direction perpendicular to the direction of extension of said gate wirings;

    a common conductor line on the signal line side formed on said substrate and extending in a direction perpendicular to the direction of extension of said signal lines;

    nonlinear elements which are respectively disposed between one end of each of said gate wirings and said common conductor line on the gate wiring side and between one end of each of said signal lines and said common conductor line on the signal line side, and each of which comprises a plurality of TFTs;

    wherein one of gate electrodes of said TFTs in each of said nonlinear elements disposed between one ends of said gate wirings and said common conductor line on the gate wiring side is formed separately from said common conductor line on the gate wiring side;

    wherein one of source/drain electrodes of said TFTs in each of said nonlinear elements disposed between one ends of said signal lines and said common conductor line on the signal line side is formed separately from said common conductor line on the signal line side;

    wherein said one of the gate electrodes of said TFTs in each of said nonlinear elements disposed between one ends of said gate wirings and said common conductor line on the gate wiring side is electrically coupled to said common conductor line on the gate wiring side via contact holes formed in an insulating film formed on said first and second conductor layers and via a third conductor layer; and

    wherein said one of the source/drain electrode of said TFTs in each of said nonlinear elements disposed between one ends of said signal lines and said common conductor line on the signal line side is electrically coupled to said common conductor line on the signal line side via contact holes formed in said insulating film formed on said first and second conductor layers and via said third conductor layer.

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